p-n Junction

Physics
NEET UG
Version 1Updated 23 Mar 2026

A p-n junction is a fundamental semiconductor device formed by joining a p-type semiconductor with an n-type semiconductor. This interface creates a region known as the depletion layer, characterized by an absence of free charge carriers and the presence of an internal electric field, which establishes a potential barrier. This barrier dictates the unidirectional flow of current, allowing signific…

Quick Summary

A p-n junction is formed by joining p-type and n-type semiconductors. At the interface, electrons from the n-side and holes from the p-side diffuse and recombine, creating a 'depletion region' devoid of mobile charge carriers but containing immobile ions.

These ions establish an internal electric field and a 'barrier potential' (e.g., 0.7,V0.7,\text{V} for Si, 0.3,V0.3,\text{V} for Ge) that opposes further majority carrier diffusion. When forward biased (p-side positive, n-side negative), the external voltage reduces the barrier and depletion width, allowing significant majority carrier current.

When reverse biased (p-side negative, n-side positive), the external voltage increases the barrier and depletion width, allowing only a tiny 'reverse saturation current' due to minority carriers. Beyond a certain reverse voltage, breakdown occurs (Zener or Avalanche), leading to a sharp increase in current.

This unidirectional conduction makes the p-n junction a fundamental component in diodes and other semiconductor devices.

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Key Concepts

Depletion Region Formation

When p-type and n-type materials are joined, majority carriers (electrons from n-side, holes from p-side)…

Barrier Potential and its Significance

The electric field within the depletion region, pointing from n-side to p-side, establishes a potential…

Forward Bias Operation

In forward bias, the external voltage source is connected such that its polarity opposes the internal barrier…

Reverse Bias Operation

In reverse bias, the external voltage source is connected such that its polarity adds to the internal barrier…

  • p-n Junction:Interface of p-type and n-type semiconductors.
  • Depletion Region:Region near junction devoid of mobile carriers, contains immobile ions.
  • Barrier Potential ($V_B$):Internal potential difference across depletion region.

- Si: VBapprox0.7,VV_B approx 0.7,\text{V} - Ge: VBapprox0.3,VV_B approx 0.3,\text{V}

  • Forward Bias:p-side to positive, n-side to negative.

- VappliedV_{applied} opposes VBV_B. - Depletion width decreases. - Veff=VBVappliedV_{eff} = V_B - V_{applied}. - Large current due to majority carriers.

  • Reverse Bias:p-side to negative, n-side to positive.

- VappliedV_{applied} adds to VBV_B. - Depletion width increases. - Veff=VB+VappliedV_{eff} = V_B + V_{applied}. - Small reverse saturation current (I0I_0) due to minority carriers.

  • Breakdown:Sudden current increase in reverse bias.

- Zener: Heavily doped, narrow depletion, direct bond breaking, reversible. - Avalanche: Lightly doped, wide depletion, collision ionization, potentially destructive.

  • Temperature Effect:VBV_B decreases with TT; I0I_0 increases with TT (doubles every 10circC10^circ C).

Positive Negative, Forward Bias, Decreased Width, Large Current. Positive Negative, Reverse Bias, Increased Width, Small Current. (PN-FB-DW-LC, PN-RB-IW-SC) - Helps remember the effects of biasing on depletion width and current.

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